Materials
Mailing Address: 327, Engineering Building VI, Dept. Materials Science and Engineering, National Chiao Tung University, Hsin Chu, Taiwan, ROCOffice Number: 327, Engineering Building VI
Tel: +886-3-5731615
Fax: +886-3-5724727
E-mail: lichang@cc.nctu.edu.tw
Introductions
Our research involves materials characterization to understand the mechanisms for epitaxial growth of semiconductor films and nanostructures which have potential applications on optoelectronic devices. The growth of these materials includes metal-organic chemical vapor deposition (CVD), microwave plasma CVD, atomic layer deposition, pulse laser deposition, and sputtering. Currently, we are studying InAs/GaAs quantum dot systems, diamond nanostructures, ZnO films. For materials characterization, we mainly use transmission electron microscopy (energy-filtering TEM, convergent beam electron diffraction, high-resolution TEM) to obtain the microstructure of the films and their interfaces with substrates. Also, scanning electron microscopy, high-resolution x-ray diffraction and atomic force microscopy are often used.
Research
- Materials Characterization of Quantum Dots Superlattice Structure by Transmission Electron Microscopy and 3D Atom Probe(Collaboration with Profs. G.D.W. Smith and A. Cerezo, Oxford University, Prof. F.R. Chen, Tsing Hua University)
- Epitaxial Growth of Diamond Films and Nanostructures for Single Photon Source
- Growth of ZnO-based Transparent Semiconductors
Selected Publications
